Product Portfolio for Sputtering Targets

The product portfolio of PVD materials includes sources for metal films, semiconductor applications, data storage, and metallic-oxide films for photovoltaic devices. Praxair Electronics has earned a reputation as a leading supplier with its extensive research and development and dedication to produce the highest quality sputtering targets:

Advanced Metallurgy
	AdvanTage™ tantalum (Ta) targets These targets provide consistent, reproducible process performance, with reliable target-to-target sputter performance and consistently low nonuniformity levels. The elimination of texture banding provides uniform microstructure, which correlates directly to the consistent-through-life sputter performance of AdvanTage tantalum targets, resulting in improved early life stability. More
	Fine grain copper (Cu) and Cu alloy targets Praxair Electronics' fine grain (FGR) 6N copper and 6N copper alloy targets with uniform microstructure and controlled texture, offer improved performance consistency and increased target life. More
	Tungsten (high-purity, high-density W) targets In order to achieve the desired film properties and minimize particle generation, control of the sputter target properties, which include density, purity, grain size, and orientation, are essential. Through a tightly controlled manufacturing process, Praxair Electronics provides 5Ns (99.999%) pure W targets with a density greater than 99.7%. More
	Ultrafine-grain aluminum (Al) alloy targets Through advanced metallurgy, Praxair Electronics' aluminum and copper (Al-0.5Cu) alloy targets provide an enhanced yield strength with a grain size of 0.5 µm, compared to 40-50µm obtained through a conventional process. More Fine-grain aluminum (Al) alloy targets Praxair Electronics' stable manufacturing process provides improved target-to-target microstructure consistency with 70% smaller grain sizes, as compared to conventional processing, resulting in higher productivity through improved sputter consistency and film properties. More
	Nickel (NiPt) platinum targets Praxair Electronics' 4N5 nickel platinum targets were developed specifically for semiconductor applications. The combination of low permeability and high purity is ideal for advanced device applications.
Improved Target Designs
	Long-life aluminum targets (RE-Al â PLUS) Praxair's RE-Al Plus targets have been designed for improved cost of ownership in aluminum deposition applications. Designed for 200mm wafer processing, the RE-Al PLUS is a further enhancement to Praxair's original ring enhanced aluminum target (RE-Al), introduced in 1999. More
	Long-life titanium targets (Re-Ti™ ) We have brought our expertise in grain size control, surface preparation, and diffusion bonding to create targets with exceptional performance. More
Ceramic Targets for Transparent Conductive Oxides (TCO)
	AZO (ZnO:Al203) targets Alumina doped zinc oxide (AZO) targets have proven to provide highly effective TCO layers in amorphous silicon (a-Si), copper indium selenide (CIS), copper indium gallium selenide (CIGS) and other thin-film photovoltaic devices. More
	Standard oxide targets In addition to alumina doped zinc oxide, we offer various configurations of undoped zinc oxide, doped zinc tin oxides, indium zinc oxide targets and shapes. More